Reference Samples

Thin film XRF reference samples

Advantages of thin film XRF reference samples:

Absorption free standard: no matrix correction necessary
Substrate thickness of 200 nm permits transmission measurements and leads to low background from the substrate
Mass depositions in the range of ng/mm² (1-3 atomic layers) permit quantification without the need to interpolate from higher values
Uncertainty = 1 ng/mm² (1 atomic layer)
Wide selection of non-overlapping XRF lines, exact calibration curve with many points over a large energy range
Signal strength easily adjustable by thickness, similar intensity for all elements
High degree of uniformity & homogeneity (better than 1% for the full sample area)
Application for adjustment of confocal μ-XRF possible
Wide range of available elements (standard and tailored compilations)

Download: Reference sample prospectus (pdf)

New Reference Samples:
AXO DRESDEN has been fabricating and selling the successful Thin Film XRF reference samples type "RF" for several years. As customers have been asking for different material compositions, we designed another type "RG" with focus on the energies between 4 keV and 9 keV which is now available.

Lateral homogeneity measured by XRF μ-beam mappings

Energy spectra of a 6-element reference sample

RF (top) and RG (bottom) measured with a lab

TXRF using Mo-K radiation (50 kV excitation).

The energy range is covered with peaks of

comparable intensity.

(Ga signal from the internal TXRF standard.)

X-ray fluorescence reference sample on a silicon nitride membrane.

PEEK sample holder and membrane dimensions: frame size 10x10 mm² or 5x5 mm², having a 5x5 mm² or 2x2 mm² usable coated membrane area.

SEM characterization materials

EDS-TM002 is a test material for the performance check of an X-ray spectrometer attached to a SEM developed in cooperation with BAM, Berlin, Germany.
It is fabricated as a compact material (size: 8×8×0.5 mm³).

EDS-TM002 can be purchased from the BAM webshop.

Photo of EDS-TM002 (left) and energy spectrum recorded with 10 kV (right).

XRR teaching tool

The teaching tool for X-ray reflectometry consists of three typical samples deposited by means of Ion Beam Deposition (IBD) on round flat Si-substrates (1 inch diameter): an uncoated silicon substrate, a thin Ni single layer and a 10-period Ni/C-multilayer. The specularly reflected intensity is measured as a function of grazing incident angle. Each measurement shows a characteristic pattern. Basic principles of total external reflexion and the interference of reflected and diffracted X-rays in a layer stack can be discussed. Layer thicknesses and interface roughnesses are determined by selected simulation programs. In addition to the three samples, the set contains an introduction document into X-ray reflectometry on a USB stick.

Concept of sample selection:
1. one interface bulk material / air
2. single layer with two interfaces
3. multilayer system with many interfaces

Application Training and further education of students, scientists, skilled workers, ...
Determination of morphological parameters: layer thickness, material density, surface and interface roughness

Teaching tool for X-ray reflectometry: pure silicon substrate, Ni single layer, 10 period Ni/C multilayer

X-ray reflectometry measurement on an uncoated silicon substrate

X-ray reflectometry measurement on a single layer

X-ray reflectometry measurement on a Ni/C multilayer

Reference Samples

Thin film XRF reference samples

SEM characterization materials

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