High Precision Deposition
HIGH PRECISION DEPOSITION
High precision large area Pulsed Laser Deposition (PLD) and magnetron sputter deposition techniques are installed
to deposit nanometer single and multilayers showing X-ray optical quality.
Across a stack of more than 500 layers with single layer thicknesses in the range between 1 to 10 nm a variation of
single layer thickness considerably lower than σD = 0.1 nm and an interface roughness below
σR = 0.25 nm is realized.
Thickness homogeneity Δd/d <1%
and lateral thickness gradients
Δd/Δx in the range of 10-8 are guaranteed across macroscopic substrate dimensions.
The deposition can be carried out on rectangular substrates and on substrates up to 8 inch diameter (LA-PLD).
These high precision layers are applied as mirrors for total reflection, for high precision reference samples
and as samples for teaching, testing and demonstration of the performance of X-ray instrumentation.